Method of manufacturing a dielectric film and method of manufacturing Metal Insulator Metal capacitor having the dielectric film and batch type atomic layer deposition apparatus for manufacturing the dielectric film,申请号KR20050069664-传众专利搜索

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发明名称	Method of manufacturing a dielectric film and method of manufacturing Metal Insulator Metal capacitor having the dielectric film and batch type atomic layer deposition apparatus for manufacturing the dielectric film
摘要
申请公布号	KR100652420(B1)	申请公布日期	2006.12.01
申请号	KR20050069664	申请日期	2005.07.29
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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