发明名称 METHOD FOR SUPPLYING A PLATING COMPOSITION WITH DEPOSITION METAL ION DURING A PLATING OPERATION
摘要 Method and plating bath apparatus for setting the ionic strength of a plating composition using Donnan dialysis by flowing the plating composition along a first surface of a membrane while simultaneously flowing a deposition metal ion exchange composition along a second surface of the membrane such that the deposition metal ion crosses the membrane from the deposition metal ion exchange composition to the plating composition while an exchange cation different from the deposition metal ion crosses the membrane from the plating composition to the deposition metal ion exchange composition.
申请公布号 US2006266654(A1) 申请公布日期 2006.11.30
申请号 US20060420339 申请日期 2006.05.25
申请人 ENTHONE INC. 发明人 KOENIG AXEL;MOBIUS ANDREAS;STARK FRANZ-JOSEF
分类号 C25D21/06;C25B15/00 主分类号 C25D21/06
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