IMMERSION LITHOGRAPHY APPARATUS AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an objective lens used for a liquid crystal immersion lithography process.

SOLUTION: An immersion lithography system 100 comprises: an objective lens 140; a substrate stage 155 positioned below the objective lens 140; a liquid crystal 160 at least partially filling a space between the objective lens 140 and a substrate 150 on the substrate stage 155; and a liquid crystal controller having a first electrode 170 and a second electrode 175 for controlling the liquid crystal 160.

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