| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve exposure precision of an exposure image without heightening resolution of an exposure image data in an exposing method to expose the exposure image by: transferring an exposing head equipped with a DMD to form an exposure point based on the exposure image data, relative to a substrate; and successively forming exposure points on the substrate corresponding to the transfer of the exposing head. <P>SOLUTION: A vector form exposure image data representing the exposure image is acquired, and simultaneously information of the exposure locus of a micro-mirror of the DMD on the substrate in exposing the exposure image is acquired. Information of an intersection location expressing a location of an intersection of a profile of the exposure image expressed with the exposure image data and an exposure point data locus on the exposure image data corresponding to the information of the exposure locus is acquired. The exposure point data corresponding to the exposure point data locus is acquired from the exposure image data, based on the information of intersection location, and the exposure is conducted with the exposing head based on the acquired exposure point data. <P>COPYRIGHT: (C)2007,JPO&INPIT |
