发明名称 PROCESSOR AND ALIGNING METHOD
摘要 PROBLEM TO BE SOLVED: To make alignment for accurate control of position of a substrate in a process chamber even if a plurality of process chambers are provided. SOLUTION: In a load lock chamber 30, positioners 33a, 33b, 33c, and 33d are arranged for aligning a substrate S placed on buffers 31 and 32. A rectangular substrate S is pressed at four points by the abutment block 36 of the positioners 33a, 33b, 33c, and 33d, in the load lock chamber 30 for alignment in X-Y direction. The position is set for each process chamber, corresponding to processing position in each process chamber. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324366(A) 申请公布日期 2006.11.30
申请号 JP20050144886 申请日期 2005.05.18
申请人 TOKYO ELECTRON LTD 发明人 SHIMURA AKIHIKO
分类号 H01L21/68;H01L21/3065 主分类号 H01L21/68
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