发明名称 ELECTRON BEAM IRRADIATION SYSTEM AND ELECTRON BEAM IRRADIATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation system and an electron beam irradiation method which can perform such a reforming processing as bridging by efficiently irradiating organic materials with electron beam and prevent integrity harming of such system as irradiation room by suppressing dissolution products, and prevent quality degradation because of stagnation of dissolution products inside the irradiation target. SOLUTION: The electron beam irradiation system and the electron beam irradiation method are constituted of an electron beam irradiation device emitting electron beam, a conveyer for carry in/carry out the organic materials as a target to be irradiated, an irradiation room for heating the target to a first specific range of temperature and irradiating electron beam, and a volatilization room which is connected with the irradiation room for heating the target after electron beam irradiation over a second specific range of temperature, so that the first specific range of temperature is set in a range of temperature in which the amount of the dissolution products discharged out of the object irradiated with the electron beam does not become a significant amount harming the integrity of the irradiation room and the second specific range of temperature is set at a range of temperature in which the dissolution products remaining in the organic material is discharged. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006322718(A) 申请公布日期 2006.11.30
申请号 JP20050143660 申请日期 2005.05.17
申请人 MITSUBISHI HEAVY IND LTD 发明人 URANO SUSUMU
分类号 G21K5/04;B01J19/12;C08J7/00;C08L101/00;G21K5/00 主分类号 G21K5/04
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