| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition method, and a vacuum vapor deposition apparatus capable of controlling the temperature of a substrate during the vapor deposition at a high temperature to a certain level, and rapidly cooling and taking out the substrate after completing the vapor deposition. SOLUTION: A substrate holder has a hollow part with a liquid to be fed therethrough. During the vapor deposition, a heating medium at a predetermined temperature is fed through the hollow part of the substrate holder. After completing the vapor deposition, a cooling medium at the temperature lower than the predetermined temperature is fed through the hollow part of the substrate holder to cool the substrate. COPYRIGHT: (C)2007,JPO&INPIT
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