APPARATUS FOR ELIMINATING A PARTICLE FROM A SEMICONDUCTOR SUBSTRATE AND EQUIPMENT FOR PROCESSING A SEMICONDUCTOR SUBSTRATE USING THE SAME

摘要

An apparatus for removing particles and semiconductor substrate processing equipment having the same are provided to prevent physical damage of a semiconductor substrate by using a detecting unit and a cleaner for eliminating the particles. A light emitting unit(111) scans a lower surface of a semiconductor substrate(W) with a ribbon-shaped wide beam. A light receiving unit(112) receives a light reflected or scattered from the lower surface. A detecting unit(130) analyzes the received light to verify existence of particles(P) on the lower surface. A cleaner(140) sucks the verified particles to remove it from the lower surface. The cleaner includes a spray module. The spray module sprays a gas to the lower surface to separate the verified particles from the lower surface.