发明名称 Manufacturing process and structure of power junction field effect transistor
摘要 A manufacturing process and a power junction field-effect transistor (JFET) are provided. The basic concept of the present invention is to allow the current to flow vertically from the drain region on the bottom side to the source region on the topside of the device. By regulating the voltage applied between the gate regions and the source region, the power junction field-effect transistor (JFET) of the present invention can be built to handle large current and higher voltage for power management purposes, as is similar to the metal oxide semiconductor field effect transistor (MOSFET).
申请公布号 US2006270132(A1) 申请公布日期 2006.11.30
申请号 US20050194847 申请日期 2005.08.01
申请人 PYRAMIS CORPORATION 发明人 ZENG JUN;SUN PO-I
分类号 H01L21/337 主分类号 H01L21/337
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