发明名称 SEMICONDUCTOR DEVICE COMPRISING A SUPERLATTICE DIELECTRIC INTERFACE LAYER
摘要 A semiconductor device may include a semiconductor substrate and at least one active device adjacent the semiconductor substrate. The at least one active device may include an electrode layer, a high-K dielectric layer underlying the electrode layer and in contact therewith, and a superlattice underlying the high-K dielectric layer opposite the electrode layer and in contact with the high-K dielectric layer. The superlattice may include a plurality of stacked groups of layers. Each group of layers of the superlattice may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions.
申请公布号 WO2006127225(A2) 申请公布日期 2006.11.30
申请号 WO2006US16998 申请日期 2006.05.02
申请人 RJ MEARS, LLC;MEARS, ROBERT, J.;HYTHA, MAREK;KREPS, SCOTT, A.;STEPHENSON, ROBERT, JOHN;YIPTONG, JEAN, AUSTIN, CHAN, SOW, FOOK;DUKOVSKI, ILIJA;RAO, KALIPATNAM, VIVEK;HALILOV, SAMED;HUANG, XIANGYANG 发明人 MEARS, ROBERT, J.;HYTHA, MAREK;KREPS, SCOTT, A.;STEPHENSON, ROBERT, JOHN;YIPTONG, JEAN, AUSTIN, CHAN, SOW, FOOK;DUKOVSKI, ILIJA;RAO, KALIPATNAM, VIVEK;HALILOV, SAMED;HUANG, XIANGYANG
分类号 H01L21/8238;H01L29/10;H01L29/15;H01L29/78 主分类号 H01L21/8238
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