发明名称 IMPROVED PATTERNING OF INDIUM-TIN OXIDE (ITO) FOR PRECISION-CUTTING AND ALIGNING A LIQUID CRYSTAL DISPLAY (LCD) PANEL
摘要 <p>A method of improved patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel includes depositing a transparent ITO layer upon a transparent substrate, depositing a non-transparent plating layer upon the transparent ITO layer and depositing a photoresist layer upon the non-transparent plating layer. The photoresist layer is patterned, exposed and developed to form a plurality of photoresist lines. The photoresist lines are exposed again in an active area only and the plating layer is etched to form a plurality of non-transparent plated lines. The ITO layer is then etched to form a plurality of ITO lines. The photoresist lines are then developed and the non-transparent plated lines are etched away in the active area only. The photoresist that is outside the active area is then removed.</p>
申请公布号 WO2006058168(A3) 申请公布日期 2006.11.30
申请号 WO2005US42628 申请日期 2005.11.22
申请人 ADVANTECH GLOBAL, LTD.;COWEN, TIMOTHY, A. 发明人 COWEN, TIMOTHY, A.
分类号 G02F1/1343 主分类号 G02F1/1343
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