发明名称 |
IMPROVED PATTERNING OF INDIUM-TIN OXIDE (ITO) FOR PRECISION-CUTTING AND ALIGNING A LIQUID CRYSTAL DISPLAY (LCD) PANEL |
摘要 |
<p>A method of improved patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel includes depositing a transparent ITO layer upon a transparent substrate, depositing a non-transparent plating layer upon the transparent ITO layer and depositing a photoresist layer upon the non-transparent plating layer. The photoresist layer is patterned, exposed and developed to form a plurality of photoresist lines. The photoresist lines are exposed again in an active area only and the plating layer is etched to form a plurality of non-transparent plated lines. The ITO layer is then etched to form a plurality of ITO lines. The photoresist lines are then developed and the non-transparent plated lines are etched away in the active area only. The photoresist that is outside the active area is then removed.</p> |
申请公布号 |
WO2006058168(A3) |
申请公布日期 |
2006.11.30 |
申请号 |
WO2005US42628 |
申请日期 |
2005.11.22 |
申请人 |
ADVANTECH GLOBAL, LTD.;COWEN, TIMOTHY, A. |
发明人 |
COWEN, TIMOTHY, A. |
分类号 |
G02F1/1343 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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