发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
摘要 <p>Provided are a photosensitive resin composition for manufacturing a black matrix having excellent pattern slope, adhesion to glass substrate, developing property, and consistency, and a black matrix useful for manufacturing a color filter of LCD device produced by the same composition. The photosensitive resin composition contains 1-40 parts by weight of acrylic binder resin having acid value of 60-80 mg/KOH; 1-20 parts by weight of photopolymerizing acrylic monomer; 0.1-10 parts by weight of photopolymerization initiator; 0-10 parts by weight of epoxide; 5-40 parts by weight of black pigment; 0.01-2 parts by weight of silane-based coupling agent; and solvent. The photosensitive resin composition has a pattern slope of 50 degrees or more. The acrylic binder resin is a copolymer of one ethylenically unsaturated monomer having at least one carboxyl group, and another ethylenically unsaturated monomer copolymerizable with the ethylenically unsaturated monomer having at least one carboxyl group. The acrylic binder resin has a molecular weight of 5,000-50,000.</p>
申请公布号 KR100655047(B1) 申请公布日期 2006.11.30
申请号 KR20050134897 申请日期 2005.12.30
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, IN JAE;LEE, CHOUN WOO;LEE, CHEON SEOK
分类号 G03F7/027;G03F7/004 主分类号 G03F7/027
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