APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA

摘要

A plasma processing apparatus is provided to reduce the weight of the apparatus itself by using an upper electrode as an upper chamber. A plasma processing apparatus includes a lower chamber, an upper electrode and a lower electrode. The lower chamber(112) has an upper opening portion. The upper electrode(114) is installed at an upper portion of the lower chamber. The lower electrode(116) is installed at a lower portion of the lower chamber. The upper and lower electrodes are spaced apart from each other. The upper electrode is used as an upper chamber to reduce remarkably the weight of the plasma processing apparatus itself. The plasma processing apparatus further includes a blocking member. The blocking member is installed between a sidewall of the upper electrode and an inner wall of the lower chamber to prevent a process gas from penetrating into a predetermined space, wherein the predetermined space is formed by the upper electrode and the lower chamber.