发明名称 Device, method, and system for pattern forming
摘要 In a pattern formation device 10 , a mold 100 for forming a pattern on a substrate 200 is heated to a temperature T 1 equal to or higher than the glass transition temperature Tg of the surface area of the substrate 200 and in this state, the mold 100 is pressed against the substrate 200 having a temperature equal to or lower than the glass transition temperature Tg to transfer the pattern of the mold 100 . Then, a heater is turned off, the mold 100 is cooled by a cooling block, and the mold 100 is then separated from the substrate 200 . A pattern forming system comprising a feeding device taking substrates 200 one by one from a magazine and feeds the same to the pattern formation device 10 is preferably formed.
申请公布号 US2006266734(A1) 申请公布日期 2006.11.30
申请号 US20030541518 申请日期 2003.12.09
申请人 FUJII MITSURU;GOTO HIROSHI;YOSHIOKA HARUO;KISHI HIDOKI 发明人 FUJII MITSURU;GOTO HIROSHI;YOSHIOKA HARUO;KISHI HIDOKI
分类号 B44C1/22;B29C31/00;B29C59/00;B29C59/02;C03C15/00;H05K3/30 主分类号 B44C1/22
代理机构 代理人
主权项
地址