发明名称 THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF
摘要 <p>A TFT and a manufacturing method thereof are provided to reinforce the adhesiveness between a substrate and a gate insulating layer by performing a surface treatment on the substrate under a predetermined plasma condition. A substrate(110) is prepared. An organic insulating layer is formed on the substrate. A surface treatment is performed on the substrate in a predetermined plasma state to intensify the adhesiveness between the substrate and the organic insulating layer before the organic insulating layer forming process. The surface treatment is performed by using one selected from a group consisting of Ar, O2, N2, CO2, and CF4.</p>
申请公布号 KR20060122600(A) 申请公布日期 2006.11.30
申请号 KR20050045192 申请日期 2005.05.27
申请人 SAMSUNG SDI CO., LTD. 发明人 LEE, HUN JUNG;SUH, MIN CHUL;PARK, YONG WOO
分类号 H01L29/786 主分类号 H01L29/786
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