发明名称 |
NEW POLYIMIDE PRECURSOR AND UTILIZATION THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polyimide precursor applicable to a rigid or an FPC (flexible printed circuit) substrate and imidizable at low temperatures. <P>SOLUTION: The polyimide precursor comprises a polyimide structure composed of a tetravalent organic acid and mainly of an aromatic diamine and a polyimide precursor structure composed of the tetravalent organic acid and an aliphatic diamine and imidizable at ≤200°C. A photosensitive resin composition comprises the polyimide precursor and an acrylic or a methacrylic compound. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006321924(A) |
申请公布日期 |
2006.11.30 |
申请号 |
JP20050147025 |
申请日期 |
2005.05.19 |
申请人 |
KANEKA CORP |
发明人 |
OKADA YOSHIFUMI;YAMANAKA TOSHIO;KOJIMA KOHEI;NOJIRI HITOSHI |
分类号 |
C08G73/10;G03F7/004;G03F7/027;G03F7/037;H05K3/28 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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