COMPOSITION FOR PHOTORESIST COATING, METHOD FOR FORMING PHOTORESIST PATTERN, AND SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a fine pattern in a semiconductor process. SOLUTION: In the method for forming the fine pattern using a composition for a photoresist coating, by coating the already formed photoresist pattern with the composition for the photoresist coating containing a water soluble polymer and an aqueous solvent, sizes of a photoresist contact hole and a space are effectively reduced. COPYRIGHT: (C)2007,JPO&INPIT