| 摘要 |
<p>The present invention provides a system and method for removing contaminating moisture from a deposition chamber prior to use. Dry air, preferably hot dry air, is blown into the deposition chamber where it absorbs and removes moisture. This is done by connecting a desiccation system including a blower and a dryer to the deposition chamber. The deposition chamber is also provided with a vacuum source; this may be connected to the deposition chamber using the same line as that used for the desiccation source, or may be connected through a separate line. The dry air may re-circulate through the chamber during this flushing method, or the dry air may flow through the deposition chamber continuously. A heat exchanger may also be provided to efficiently reuse hot air used to recharge the desiccation system. The desiccation system and method are particularly suited for decontaminating a magnetron sputtering deposition chamber.</p> |
