发明名称 MANUFACTURING METHOD OF FILM SUBSTRATE FOR WIRING, MANUFACTURING DEVICE, AND FILM SUBSTRATE FOR WIRING
摘要 PROBLEM TO BE SOLVED: To simply provide a highly reliable film substrate for wiring that is suitable for transmitting a high-frequency signal, and enables high-density mounting. SOLUTION: The manufacturing method of the film substrate for wiring includes a conductor thin-film forming step in which a conductor seed layer 3 of a conductor thin-film is formed on the surface of a liquid crystal polymer film 1 of a thermoplastic resin film by a non-electrolytic plating method via a Pd catalyst 2, and a heat crimping step for thermally crimping the liquid crystal polymer film 1 in which the conductor seed layer 3 is formed by the conductor thin-film forming step, and the conductor seed layer 3 at a temperature lower than a melting point while applying shearing forces in the film face direction to them. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324545(A) 申请公布日期 2006.11.30
申请号 JP20050147626 申请日期 2005.05.20
申请人 HITACHI MAXELL LTD 发明人 FUKAO RYUZO;HIETA HARUMI
分类号 H05K3/00;C23C18/31;H05K1/02;H05K3/18;H05K3/38 主分类号 H05K3/00
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