| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple embedded film formation method of a transparent material having a high refractive index by a method for preventing a void from occurring inside an optical waveguide when manufacturing an image pickup device having an optical waveguide section. SOLUTION: Large pulsation is applied to a degree of vacuum in film formation for performing CVD. When a CVD gas is injected while the degree of vacuum is high, the CVD gas enters a pore for forming a film. Then, when the CVD gas is stopped, and evacuation is made greatly, a reaction residual gas in the pore is discharged. By repeating the above, the CVD gas enters the pore for forming a film. By the repetition, embedding is made without any voids. COPYRIGHT: (C)2007,JPO&INPIT
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