Structural parameter e.g. line width, determining method for use in semiconductor manufacturing, involves analyzing formula for spectrum in partial formula so that partial formulas are newly computed during computation of spectrum

摘要

#CMT# #/CMT# The method involves measuring the spectrum of an object and comparing the measured spectrum with a computed model spectrum. The formula for computing the model spectrum is analyzed in the partial formula such that only partial formulas are newly computed during the computation of further spectrum with the changed model structural parameters. The partial formula has changed model structural parameters. #CMT#USE : #/CMT# For determining the structural parameters e.g. line width, line period, side wall skewness and trench depth of a line, in semiconductor manufacture. #CMT#ADVANTAGE : #/CMT# The formula for computing the model spectrum is analyzed in the partial formula such that only partial formulas are newly computed during the computation of further spectrum with the changed model structure parameters, hence the temporal expenditure during the change of the model structure parameter is reduced. The method reduces the computation time for the parameters by the variation of the parameters. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure shows a schematic view of a procedure for determining the structural parameters.