| 摘要 |
An apparatus and method for attaching a pellicle to a mask for use in optical lithography comprises a lithographic mask; a pellicle ring; and a binding layer having a thickness of less than 100 nanometers between the pellicle ring and the lithographic mask. The binding layer comprises a graded oxide layer or anodic oxide layer. Alternatively, the binding layer comprises a polymer having a material composition capable of being vapor deposited, wherein the polymer comprises a maleic anhydride polymer. Still alternatively, the binding layer comprises a polymer having a uniform material composition. Another embodiment provides that the binding layer comprises a polymer having a material composition capable of being reactive with a bonding agent. Additionally, the pellicle ring comprises a pellicle and a pellicle frame, wherein the method further comprises applying a binding layer having a thickness of less than 100 nanometers between the pellicle and the pellicle frame.
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