METHOD FOR FABRICATING A FIELD OXIDE IN A SEMICONDUCTOR DEVICE,申请号KR20040113259-传众专利搜索

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发明名称	METHOD FOR FABRICATING A FIELD OXIDE IN A SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100652288(B1)	申请公布日期	2006.11.30
申请号	KR20040113259	申请日期	2004.12.27
申请人		发明人
分类号	H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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