发明名称 ELECTRON BEAM GENERATING DEVICE AND TFT ARRAY SUBSTRATE INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To automatically control the beam current of an electron beam irradiated from a filament to a constant value, and to control the beam current to the constant value without stopping a production line in a TFT array substrate inspection device incorporated in the production line. SOLUTION: In this electron beam generating device 1 which emits the electron beam from the filament by thermionic emission, filament current control means 4, 5 to control a filment current flowing in the filament 3 are provided, and the beam current is controlled to the constant value by detecting the beam current of the electron beam and feeding back the detected value to the filament current control means. The filament current control means 5 more effectively control the beam current of the electron beam to the constant value by feeding back the detected value of the beam current irradiated toward the TFT array substrate 10 from the filament 3. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324124(A) 申请公布日期 2006.11.30
申请号 JP20050146287 申请日期 2005.05.19
申请人 SHIMADZU CORP 发明人 NOJI TAKETOSHI
分类号 H01J37/04 主分类号 H01J37/04
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