| 摘要 |
An anti-reflection coating layer is formed between an under layer and a photoresist layer. The anti-reflection coating is characterized in a refraction value (n) of the anti-reflection coating layer, wherein n is a constant, and an extinction coefficient (k) of the anti-reflection coating layer, increasing in gradient toward the under layer. Thus, the substrate reflectivity with respect to different under layers can be substantially equal to 0 by controlling the k of the anti-reflection coating layer.
|
