Method of fabricating microelectronic patterns by forming intermixed layers of water-soluble resins and resist material,申请号KR20020077736-传众专利搜索

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发明名称	Method of fabricating microelectronic patterns by forming intermixed layers of water-soluble resins and resist material
摘要
申请公布号	KR100652371(B1)	申请公布日期	2006.11.30
申请号	KR20020077736	申请日期	2002.12.09
申请人		发明人
分类号	G03F7/00;G03F1/08;G03F7/40;H01L21/027	主分类号	G03F7/00
代理机构		代理人
主权项
地址

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