发明名称 ATMOSPHERIC PRESSURE MICROWAVE PLASMA REACTION DEVICE AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure microwave plasma reaction device capable of carrying out plasma treatment at high speed and low cost by exciting high-density plasma with small power. <P>SOLUTION: The atmospheric pressure plasma reacting device (10) is composed of a microwave rectangular waveguide (1), a dielectric tube (2) crossing the waveguide (1) and penetrate it, and metal pipes for microwave leak prevention (3a, 3b) put on the dielectric tube (2). Microwaves are given by a microwave oscillator while gas such as inert gas is guided into the dielectric tube (2), and plasma is excited in the tube (2). A plasma field (6) is formed at an end of the tube (2), and fiber or fabric (5) is made to pass the plasma field (6) to apply a surface reforming treatment. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324146(A) 申请公布日期 2006.11.30
申请号 JP20050147203 申请日期 2005.05.19
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 ANDO HIDEKAZU;MIZUSHIMA KOJI;ASARI SATORU;UCHIDA MASASHI;TSUNODA MITSUO
分类号 H05H1/24;B01J19/08;D06M10/02 主分类号 H05H1/24
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