发明名称 HIGH PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
摘要 <p>Provided are a photosensitive resin composition for manufacturing a black matrix which has excellent photosensitivity, improved sensitivity effect at same exposure, and adjustable time for alkali developing process, and a black matrix manufactured from the same composition. The photosensitive resin composition comprises a photopolymerization initiator based on biphenyl triazine of the formula(9). The part[A] of the formula 9 is represented by the formula(22). In the formulae(9) and (22), each X and X2 is independently H, CH3, C2H5, CH2=CH, or OH. The photosensitive resin composition comprises 1-40 parts by weight of kado-based binder resin; 1-20 parts by weight of photopolymerizing acrylic monomer; 0.1-10 parts by weight of photopolymerization initiator based on biphenyl triazine; 5-20 parts by weight of black pigment; and 0.01-20 parts by weight of silane-based coupling agent.</p>
申请公布号 KR100655048(B1) 申请公布日期 2006.11.30
申请号 KR20050134989 申请日期 2005.12.30
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, CHOUN WOO;LEE, CHEON SEOK;OH, HEE YOUNG;KANG, HYUN JUNG;KIM, TAE UK
分类号 G03F7/027;G03F7/004;G03F7/028 主分类号 G03F7/027
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