发明名称 PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a preventive maintenance safety technique capable of diagnosing an apparatus condition without severely deteriorating operating efficiency. SOLUTION: A plasma processing apparatus comprises a sample placement electrode 10 for placing, sucking, and holding a sample in a vacuum processing chamber; a plasma producing high frequency power supply 8 for applying high frequency power to introduced processing gas to produce plasma; a plasma processing apparatus body 50 including a conveying apparatus for conveying a sample onto the sample placement electrode 10, and conveying out a sample for which processing is completed; and an apparatus controller 13 for controlling the plasma processing apparatus body 50. The apparatus controller 13 includes a diagnosing device 100 for controlling the plasma processing apparatus body 50 in accordance with a previously set procedure, acquiring a plurality of recipes for applying processing for every sample to a conveyed sample, acquiring an apparatus parameter of the plasma processing apparatus body 50 in execution of a specific recipe in the plurality of the recipes, and diagnosing the quality of the state of the plasma processing apparatus body 50 on the basis of the acquired apparatus parameter. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324316(A) 申请公布日期 2006.11.30
申请号 JP20050144043 申请日期 2005.05.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IKUHARA SHIYOUJI;SHIRAISHI DAISUKE;YAMAMOTO HIDEYUKI;KAGOSHIMA AKIRA;ENAMI HIROMITSU;KARASHIMA YOSUKE;MATSUMOTO EIJI
分类号 H01L21/3065 主分类号 H01L21/3065
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