发明名称 |
ENERGY BEAM IRRADIATOR AND IRRADIATING METHOD |
摘要 |
<p>[PROBLEMS] To provide an energy beam irradiator suitable for enhancing the processing capability of an apparatus and reducing gas consumption and installation space of the apparatus, and to provide an irradiating method. [MEANS FOR SOLVING PROBLEMS] When a protective sheet T stuck to a wafer W while having UV-curing adhesive A is stripped by irradiating the adhesive A of the protective sheet T with UV-rays thereby lowering its bonding force, the wafer W with the protective sheet T is suction held by a supporting member (3) and irradiated with UV-rays from a UV lamp (2) while being held. At that time, nitrogen gas N is jetted from a gas ejection region GA adjacent to the wafer suction holding region SA of the supporting member (3).</p> |
申请公布号 |
WO2006126390(A1) |
申请公布日期 |
2006.11.30 |
申请号 |
WO2006JP309367 |
申请日期 |
2006.05.10 |
申请人 |
LINTEC CORPORATION;KURITA, TSUYOSHI |
发明人 |
KURITA, TSUYOSHI |
分类号 |
C09J5/00;B05D3/06;G21K5/00 |
主分类号 |
C09J5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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