发明名称 |
METHOD OF MANUFACTURING COLD-CATHODE ELEMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a cold-cathode element capable of restraining unevenness of electron emitting characteristics. <P>SOLUTION: The method of manufacturing the cold-cathode element comprises a process of imparting a surface of a fluorinated photoresist layer 16 with a hydrophylic property by dissolving or removing the surface thereof by a prescribed size, and a process of weakening a water repellent property generated on the surface of the photoresist layer 16 by immersing the photoresist layer in etching solution in which a surfactant is added. The etching solution is made easy to penetrate into holes formed on an insulation layer 13 when applying wet etching. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2006324209(A) |
申请公布日期 |
2006.11.30 |
申请号 |
JP20050148476 |
申请日期 |
2005.05.20 |
申请人 |
NIPPON HOSO KYOKAI <NHK>;ULVAC JAPAN LTD;ULVAC SEIMAKU KK |
发明人 |
HAGIWARA HIROSHI;TAKEI TATSUYA;ATOZAWA MIZUYOSHI;HIRAKAWA MASAAKI;NAKANO MINAO;MURAKAMI HIROHIKO;OKASAKA KENSUKE;SASAKI TAKAHIDE |
分类号 |
H01J9/02 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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