APPARATUS FOR SUPPLYING PHOTORESIST AND METHOD OF SUPPLYING PHOTORESIST USING THE SAME

摘要

An apparatus for supplying a photoresist and a photoresist supplying method using the same are provided to remove foreign materials residing on a supplying pipe by using a flow characteristic converting member. A supplying unit supplies a photoresist. A supplying pipe(160) is connected to the supplying unit. A flow characteristic converting member(170) is formed on the supplying pipe. The flow characteristic converting member converts flow characteristic of the photoresist from laminar flow into turbulent flow to remove foreign materials residing on the supplying pipe. The flow characteristic converting member includes a cylinder(172) and a valve(174). The cylinder is vertically connected to the supplying pipe and has a buffer space for changing a cross section of the supplying pipe. The valve is arranged in the cylinder to change volume of the buffer space.