发明名称 |
Method and apparatus for using solution based precursors for atomic layer deposition |
摘要 |
<p>A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.</p> |
申请公布号 |
SG126910(A1) |
申请公布日期 |
2006.11.29 |
申请号 |
SG20060002842 |
申请日期 |
2006.04.27 |
申请人 |
THE BOC GROUP, INC. |
发明人 |
CE MA;MIN WANG QING;HELLY, PATRICK, J.;HOGLE RICHARD |
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