发明名称 METHODS OF TREATING DEPOSITION PROCESS COMPONENTS TO FORM PARTICLE TRAPS, AND DEPOSITION PROCESS COMPONENTS HAVING PARTICLE TRAPS THEREON
摘要 The invention includes methods for forming particle traps along surfaces of PVD components, and comprises PVD components having particle traps thereon. The invention can include utilization of highly soluble media for bead-blasting and/or can include utilization of metallic materials as bead-blasting media. The invention can also include formation of an insert along regions of a backing plate where particle traps are desired, with the insert being of a composition which has better particle-trapping properties than the backing plate.
申请公布号 KR20060121862(A) 申请公布日期 2006.11.29
申请号 KR20067004788 申请日期 2006.03.08
申请人 HONEYWELL INTERNATIONAL INC. 发明人 KIM, JAE YEON;SAYLES SCOTT R.;KARDOKUS JANINE K.;PHELAN TERRY J.
分类号 B08B7/00;B24C1/00;B24C11/00;C23C14/34;C23C14/56;C23C16/44 主分类号 B08B7/00
代理机构 代理人
主权项
地址