发明名称 NEGATIVE RESIST COMPOSITION
摘要 <p>The negative resist composition of the present invention comprises a silsesguioxane resin (A) comprising a constituent unit (a1) represented by the following general formula (I) and a constituent unit (a2) represented by the following general formula (II), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C): wherein R 1 represents a linear or branched alkylene group having to 5 carbon atoms, and</p>
申请公布号 EP1726992(A1) 申请公布日期 2006.11.29
申请号 EP20050720597 申请日期 2005.03.11
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 ANDO, TOMOYUKI
分类号 G03F7/038;C08G77/16;G03F7/004;G03F7/075;H01L21/027 主分类号 G03F7/038
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