发明名称 |
MICROFEATURE WORKPIECE PROCESSING APPARATUS AND METHODS FOR BATCH DEPOSITION OF MATERIALS ON MICROFEATURE WORKPIECES |
摘要 |
The present disclosure describes apparatus and methods for processing microfeature workpieces, e.g., by depositing material on a microelectronic semiconductor using atomic layer deposition. Some of these apparatus include microfeature workpiece holders that include gas distributors. One exemplary implementation provides a microfeature workpiece holder adapted to hold a plurality of microfeature workpieces. This workpiece holder includes a plurality of workpiece supports and a gas distributor. The workpiece supports are adapted to support a plurality of microfeature workpieces in a spaced- apart relationship to define a process space adjacent a surface of each microfeature workpiece. The gas distributor includes an inlet and a plurality of outlets, with each of the outlets positioned to direct a flow of process gas into one of the process spaces.
|
申请公布号 |
KR20060121814(A) |
申请公布日期 |
2006.11.29 |
申请号 |
KR20067003532 |
申请日期 |
2004.08.18 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
ZHENG LINGYI A.;DOAN TRUNG T.;BREINER LYLE D.;PING ER XUAN;WEIMER RONALD A.;KUBISTA DAVID J.;BEAMAN KEVIN L.;BASCERI CEM |
分类号 |
C23C16/458;C23C16/00;C23C16/44;C23C16/455 |
主分类号 |
C23C16/458 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|