发明名称 |
SYSTEM, METHOD AND APPARATUS FOR SELF-CLEANING DRY ETCH |
摘要 |
<p>A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.</p> |
申请公布号 |
EP1725344(A2) |
申请公布日期 |
2006.11.29 |
申请号 |
EP20040815901 |
申请日期 |
2004.12.30 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BAILEY, ANDREW, D., III;LOHOKARE, SHRIKANT, P.;HOWALD, ARTHUR, M.;KIM, YUNSANG |
分类号 |
B08B6/00;B08B9/00;B44C1/22;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;H01L21/321;H01L21/3213;H01L21/44;H01L21/461;H01L21/4763;H01L21/768;H01L23/48;H01L23/52;H01L29/24;H01L29/40;H01L33/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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