发明名称 CATALYTIC ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS HAVING EFFECTIVE FILAMENT OF ARRANGEMENT STRUCTURE
摘要 A catalytic enhanced chemical vapor deposition apparatus having an effective filament of an arrangement structure is provided to obtain a uniform thin film by effectively arranging W filaments of the catalytic enhanced chemical vapor deposition apparatus. A catalytic enhanced chemical vapor deposition apparatus having an effective filament of an arrangement structure includes at least two electrodes(160), a plurality of gas nozzles(140), and a shower head(130) composed of at least one filament(150). The filament(150) has a symmetric structure in right and left sides with respect to a central portion of the shower head(130).
申请公布号 KR20060121577(A) 申请公布日期 2006.11.29
申请号 KR20050043827 申请日期 2005.05.24
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, HAN KI;HUH, MYUNG SOO;KIM, MYOUNG SOO;LEE, KYU SUNG
分类号 H05B33/10;C23C14/22 主分类号 H05B33/10
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