发明名称 |
CATALYTIC ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS HAVING EFFECTIVE FILAMENT OF ARRANGEMENT STRUCTURE |
摘要 |
A catalytic enhanced chemical vapor deposition apparatus having an effective filament of an arrangement structure is provided to obtain a uniform thin film by effectively arranging W filaments of the catalytic enhanced chemical vapor deposition apparatus. A catalytic enhanced chemical vapor deposition apparatus having an effective filament of an arrangement structure includes at least two electrodes(160), a plurality of gas nozzles(140), and a shower head(130) composed of at least one filament(150). The filament(150) has a symmetric structure in right and left sides with respect to a central portion of the shower head(130).
|
申请公布号 |
KR20060121577(A) |
申请公布日期 |
2006.11.29 |
申请号 |
KR20050043827 |
申请日期 |
2005.05.24 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
KIM, HAN KI;HUH, MYUNG SOO;KIM, MYOUNG SOO;LEE, KYU SUNG |
分类号 |
H05B33/10;C23C14/22 |
主分类号 |
H05B33/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|