ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS FOR MANUFACTURING SEMICONDUCTOR

摘要

An atmospheric pressure chemical vapor deposition apparatus for manufacturing a semiconductor is provided to largely increase productivity by cooling a muffle within a short time. An atmospheric pressure is maintained inside a muffle(10). The muffle forms a temperature process atmosphere by using a heater. A plurality of supply holes(11) are formed at an upper surface of the muffle(10) to open upwardly. A wafer conveying unit(20) rotates from one side of the muffle to another side thereof by a driving unit. A wafer is mounted on an upper surface of the wafer conveying unit, which enters into the muffle. A cooling gas supply pipe(31) is fixed to the muffle so that injection nozzles(33) are positioned downwardly through the gas supply holes. A cooling unit(30) injects cooling gas into the muffle through the injection nozzles.