Special purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
摘要
申请公布号
SG126906(A1)
申请公布日期
2006.11.29
申请号
SG20060002823
申请日期
2006.04.26
申请人
ASML NETHERLANDS B.V.
发明人
HERPEN VAN MAARTEN MARINUS JOHANNES WILHELMUS;BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;KLUNDER DERK JAN WILFRED
