发明名称 ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS
摘要 For manufacturing particularly uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density, halogenated or pseudohalogenated monomeric pheanzinium compounds or a purity at least 85 mole-% and having the general chemical formula (I) are utilized in which R1, R 2, R3, R4. R5, R6, R7, R7'', R8, R9, X and A-have the significations denoted in the claims. The compounds are prepared by diazotizing a suited starting compound prior to halogenating or pseudohalogenating it in the presence of mineral acid, diazotization means and halide or pseudohalide, with the reaction steps being run in one single vessel.
申请公布号 KR20060121211(A) 申请公布日期 2006.11.28
申请号 KR20067012131 申请日期 2004.11.09
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 GRIESER UDO;BRUNNER HEIKO;DAHMS WOLFGANG
分类号 C07D241/46;C25D3/38 主分类号 C07D241/46
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