发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
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申请公布号 |
US7142287(B2) |
申请公布日期 |
2006.11.28 |
申请号 |
US20060345316 |
申请日期 |
2006.02.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KROON MARK;VAN BEEK MICHAEL CORNELIS;DIRKSEN PETER;KURT RALPH;OWEN CASSANDRA MAY |
分类号 |
G03B27/72;G03B27/42;G03B27/54;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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