发明名称 Imprinting lithography using the liquid/solid transition of metals and their alloys
摘要 A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
申请公布号 US7141275(B2) 申请公布日期 2006.11.28
申请号 US20040870664 申请日期 2004.06.16
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 CHEN YONG
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
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