发明名称 |
Imprinting lithography using the liquid/solid transition of metals and their alloys |
摘要 |
A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
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申请公布号 |
US7141275(B2) |
申请公布日期 |
2006.11.28 |
申请号 |
US20040870664 |
申请日期 |
2004.06.16 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
CHEN YONG |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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