发明名称 Method of forming poly insulator poly capacitors by using a self-aligned salicide process
摘要 A method of forming poly insulator poly capacitors by using self-aligned salicide process for mixed mode analog devices. These capacitors are formed in the self-aligned salicide process as stacked poly insulator poly (PIP) capacitors. In the self-aligned salicide process, a self-aligned salicide block process is needed to protect the the salicide formation process from electrostatic discharge (ESD) devices such as resistors or capacitors. The oxide layer of the self-aligned salicide block is used as the dielectric layer of the capacitors to form the PIP capacitor. Therefore, some process steps are omitted due to the formation of the PIP capacitors.
申请公布号 US7141469(B2) 申请公布日期 2006.11.28
申请号 US20040967198 申请日期 2004.10.19
申请人 GRACE SEMICONDUCTOR MANUFACTURING CORPORATION 发明人 KAO JUNG-CHENG;FANG HAO
分类号 H01L21/8238;H01L21/02;H01L21/20;H01L21/31;H01L21/3205;H01L21/4763;H01L21/822;H01L21/8242;H01L27/06 主分类号 H01L21/8238
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