| 摘要 |
An electrostatic chuck is provided to prevent the leak of cooling gas due to the damage of a conventional O-ring by using a Kalrez O-ring. An electrostatic chuck(10) is used for loading stably a wafer in a process chamber. The electrostatic chuck includes a Kalrez O-ring. The Kalrez O-ring(130) is inserted into a predetermined portion between a cooling gas guide(70) and the electrostatic chuck in order to seal completely the cooling gas guide and the electrostatic chuck, wherein the cooling gas guide is attached to the electrostatic by using a connection part. The Kalrez O-ring has an improved water resistance capability and intensified elasticity. The cooling gas guide is made of an insulating material.
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