| 摘要 |
An exposure apparatus (EX) has a substrate stage (PST) capable of moving while holding a substrate (P), a substrate alignment system (5) for detecting an alignment mark (1) on the substrate (P) held by the substrate stage (PST) and detecting a reference mark (PFM) provided on the substrate stage (PST), and a mask alignment system (6) for detecting through a projection optical system (PL) a reference mark (MFM) provided on the substrate stage (PST). The reference mark (PFM) on the substrate stage (PST) is detected without a liquid by using the substrate alignment system (5), and the reference mark (MFM) on the substrate stage (PST) is detected using the mask alignment system (6) through the projection optical system (PL) and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system (5) and a projection position of a pattern image is obtained. By this, alignment processing can be accurately performed in liquid immersion exposure. |
