PELLICLE FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME

摘要

A lithographic pellicle and a manufacturing method thereof are provided to restrain the deformation of a pellicle frame regardless of a pellicle size and to prevent the damage of a mask by using an improved pellicle layer. A large sized pellicle is used as a lithographic pellicle. The large sized pellicle is composed of a pellicle frame(2) with a side length range of 300 mm or more and a pellicle layer(3) on the pellicle frame. The pellicle layer is made of an amorphous fluorine polymer. The tension of the pellicle layer is in a predetermined range of 0 to 2 Î 10^-2 N/mm. The pellicle frame is made of a predetermined aluminium alloy. The predetermined aluminium alloy is one selected from a group consisting of JIS A5000 based aluminium alloy, A6000 based aluminium alloy and A7000 based aluminium alloy.