发明名称 STAGE DEVICE AND EXPOSURE SYSTEM USING STAGE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce influence of a measurement error in a stage device measuring a position by using a laser interferometer and a mirror. <P>SOLUTION: The stage device for measuring the position of a stage by using the interferometer and the mirror reflecting light from the laser interferometer comprises a mirror shape calculation means for calculating the shape of the mirror, and a temperature regulating means for regulating the temperature of the mirror on the basis of output from the mirror shape calculation means. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006317316(A) 申请公布日期 2006.11.24
申请号 JP20050141030 申请日期 2005.05.13
申请人 CANON INC 发明人 SEKINE HIROKAZU
分类号 G01B11/00;G01B11/16;G01B11/24;G03F9/00;H01L21/027;H01L21/68 主分类号 G01B11/00
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