| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which performs high-definition exposure by high solution. <P>SOLUTION: In the exposure apparatus, a part is filled with liquid between a surface of a body to be exposed and a last face of the nearest projection optical system to the surface of the body to be exposed, and the body to be exposed is exposed through the projection optical system and liquid. The apparatus is provided with a liquid holder which is placed at the periphery of the body to be exposed, has the same height as the surface of the body to be exposed, and holds the body to be exposed, and liquid. In the exposure apparatus, a fine structure regulating a contact angle with liquid is formed on the surface of the liquid holder. <P>COPYRIGHT: (C)2007,JPO&INPIT |
