| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor capable of effectively removing a deposited film attached to the outer periphery of a rear face of an object to be processed without adversely affecting other parts. SOLUTION: The plasma processor includes a vacuum processing container 1, a means for introducing a processing gas to the container 1, an antennal electrode 3 for applying high frequency power to the introduced processing gas for generating plasma, a mounting electrode 4 provided in the container 1 for mounting the object to be processed thereon, and a pusher pin 8 for pushing up the object 2 mounted on the electrode 4 for keeping it on the electrode. The mounting electrode 4 includes an inner peripheral side mounting electrode 4-1 for mounting the object 2; an outer peripheral side mounting electrode 4-2 for mounting a focus ring 12; and a high frequency power source 5-3 for supplying power to the inner peripheral side mounting electrode and the outer peripheral side mounting electrode, for applying the high frequency power to the electrode 4-2 by the power source 5-3 to generate the plasma around the outer periphery of the rear face of the object to be processed. COPYRIGHT: (C)2007,JPO&INPIT
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